Overview

Speed equipment qualification with wireless measurements.

Collect and display particle data wirelessly using the APS3 and CyberSpectrum™ software for real-time equipment diagnostics. Compare past and present as well as one tool to another with ParticleSpectrum™. Save time by swiftly locating contamination sources and see the effect of cleanings, adjustments and repairs in real time.

Shorten equipment maintenance cycles with wafer-like form factor.

Detect particles in real-time without opening the tool, so you don’t need to expose process areas to the environment. Thinner and lighter APS3 goes where wafers go to find the place where particles contaminate wafers. Once the location of particles is identified, tools may be selectively cleaned. Open only the dirty portion, keep the clean areas clean.

Lower equipment expenses with objective and reproducible data.

Raise your first-pass monitor wafer success, reduce your qualification expense and increase availability with APS3. Receive early warning for impending equipment failures and optimize your preventative maintenance plans. Establish a baseline from a known clean tool, then cycle APS3 through a candidate tool before committing monitor wafers.