Descum

Plasma Solution for WLP, MEMS, TFH, Image Sensors, & PV

Photoresist residue sometimes remains after development, processing, and resist strip. Plasma treatment provides uniform removal of small quantities of resist over the entire surface of the wafer prior to further post processing.


Solutions for WLP, MEMS, TFH, Image Sensors, & PV
Wafer Cleaning | Descum | Stripping and Etch | Wafer Pre-Treatment |
BCM & UBM Adhesion | Dielectric Patterning | Via Cleaning | Bump Adhesion

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