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The RIE-1701 Plasma System from Nordson MARCH is excellent for metal etching, sillicide etching, etching of III-V compounds, anisotropic etching of nitrides, oxides, and polyimides. It provides for chamber pressure control independent of process gas flow.
The new AP-1500 plasma system from Nordson MARCH is an extra-large “batch”-type plasma system used to clean and treat electronic components, circuit boards, and medical & life science devices for a variety of assembly and packaging applications.
FlexTRAK-BH from Nordson MARCH accommodates a wide range of boat sizes in the same system, yielding unmatched production flexibility. Its small chamber volume and proprietary process control system provide short cycle times, with high machine autonomy.
The AP-600 and AP-300 plasma systems' control module monitors and controls the vacuum and gas flow, chamber pressure, and power level. The easy-to-use interface provides automatic operation, is user-friendly, and ensures reproducible process conditions.
Nordson MARCH's AP-1000 has a PLC controller with touch screen interface that provides industrial reliability and easy use. It is designed to meet the rigorous demands of 24-hour operation in high-performance manufacturing environments.
Designed to provide the most efficient plasma processing with short cycle times, the PM-100 Plasma System from Nordson MARCH is ideal for laboratories, universities, and R&D facilities that are sensitive to the cost of capital equipment.
The patented XTRAK-IFP (Ion Free Plasma) System from Nordson MARCH is ideal for cleaning pre-programmed memory devices where UV light exposure is an issue. It enables only chemically active radicals to perform the work, eliminating ions & photons.
FlexTRAK-WR from Nordson MARCH is an integrated semiconductor wafer handling system that provides rapid material transfer for a wide range of wafer sizes. Processing can be done from most type of wafer cassettes and front opening unified pods (FOUP).
The new FlexTRAK-2MB plasma system from Nordson MARCH is designed for high throughput in-line plasma processing of semiconductor devices held in boats, trays, or other flat carriers, up to 2 boats per plasma cycle.
Patented chamber design and control architecture of Nordson MARCH's FlexTRAK-SH enable short plasma cycle times with very low overhead, ensuring that throughput is maximized and cost of ownership is minimized.
The advanced design of Nordson MARCH's FlexTRAK-CD enables high throughbout plasma processing of lead frames and strips in a very compact chassis. The F3-type plasma chamber provides unmatched treatment uniformity and process repeatability.
The FlexTRAK from Nordson MARCH offers high-throughput capability. Its small chamber volume and proprietary process control enable unmatched short cycle times, while its unique slim structure minimizes floor space requirements.
Semiconductor & Wafer Solutions
Mr. Szymanski works to expand strategic alliances, strengthen partnerships with equipment suppliers, and develop future product offerings tailored to the semiconductor market. With 10+ years of experience at major semiconductor companies, he holds a B.S. degree in Mechanical Engineering from UCLA, and an M.B.A.
Dr. Zhao joined Nordson MARCH in 2001. He is responsible for application process development, R&D and key account support. Prior to Nordson MARCH, Dr. Zhao has held positions in the university system and semiconductor industry. Dr. Zhao holds a Ph.D. in Chemical Engineering from the University of Missouri-Columbia and has been working in the plasma application field for more than 10 years.
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