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AP-1000 Plasma Treatment System

AP-1000 Plasma Treatment System

The Nordson MARCH AP-1000 Plasma System is designed to meet the rigorous demands of 24-hour operation in high performance manufacturing environments. The system delivers uniform plasma treatment with unmatched reliability, safety and ease of operation.

Uniform plasma treatment for the most demanding production environments

The AP-1000 platform is completely self-contained, requiring minimal floor space. The pump, chamber, control electronics, and 13.56 MHz RF generator are housed in a single enclosure. Full front access allows for convenient access to all interior components. The pump is positioned on rollers for easy removal.

The plasma chamber is constructed of 11-gauge stainless steel with aluminum fixtures for superior durability. The chamber has multiple removable and adjustable shelves to accommodate a range of part carriers, including magazines, trays, wafer and Auer boats.

Enhanced productivity for high-volume capacity requirements

The AP-1000 Plasma System with optional HTP (high throughput) shelves combines the reliability and process quality of the AP-1000 system with the proven benefits of Nordson MARCH’s unique shelf design. The AP-1000 HTP optimizes use of the reactive ions found in RF plasma, increasing treatment uniformity while decreasing process time.

The AP-1000 HTP system allows selection from a range of process gases such as Argon, Hydrogen and Helium. It comes standard equipped with four mass flow controllers for optimal gas control. Slotted magazines are placed vertically inside the chamber.

Additionally, slotted magazines can be placed vertically inside the chamber. Typically, each magazine holds a minimum of 20 lead frames. The AP-1000 plasma chamber can hold up to 12 magazines, depending on magazine size.

Features and Benefits

  • PLC controller with touch screen provides an intuitive graphical interface and real time process representation
  • Flexible shelf architecture allows processing of a wide variety of part carriers in either direct or downstream plasma mode
  • 13.56 MHz RF generator has automatic impedance matching for unparalleled process reproducibility
  • Proprietary software control system generates process and production data for statistical process control

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