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2010 News

July 13, 2010
Nordson MARCH to Display New AP-600 Medium-Size Batch Plasma System and New RIE-1701 Anisotropic Reactive Ion Etch (RIE) Plasma System at SEMICON West 2010
Come and see these exciting new plasma systems at the Nordson MARCH booth, North Hall, Booth #5947.

July 12, 2010
Nordson MARCH to Display Boat-Handling FlexTRAK-2MB Plasma System at SEMICON West 2010
The advanced FlexTRAK-2MB Plasma System has the ability to process two (2) boats per plasma cycle. The system is an in-line design, which accepts the boats from an upstream conveyor, and then sends the boats downstream on the same conveyor after plasma processing. It is ideally suited for plasma treatments before flip chip (FC) underfill and other advanced semiconductor packaging applications.

April 14, 2010
Nordson MARCH Releases New PlasmaLINK and ProcessLINK Software for Remote Control and Data Logging
The basic package, called PlasmaLINK, is available for the AP-1500, AP-1000, AP-600, AP-300, FP64, and RIE-1701 plasma systems. ProcessLINK adds a barcode reading module to the basic package, for customers who use barcode readers to for lot and recipe tracking. 

April 7, 2010
Nordson MARCH Announces New PCB-400 Plasma System for Advanced PCB Processing
The new PCB-400 plasma system is a small-footprint system designed primarily for PCB desmear, etch-back, and via cleaning applications.

March 30, 2010
Nordson MARCH Launches New Website
The new site (www.nordsonmarch.com) reflects Nordson MARCH's growing presence as the plasma technology leader for its Semiconductor, PCB, and Life Science/Medical Device Manufacturing market segments.

March 2, 2010
Nordson MARCH to Display Advanced Plasma Systems at SEMICON China 2010
Visit Nordson MARCH at Booth #2143 where we will be displaying our advanced plasma technology for semiconductor, LED and IC device manufacturing.

January 31, 2010
Nordson MARCH Announces New RIE-1701 Anisotripic Reactive Ion Etch (RIE) Plasma System
The RIE-1701 plasma system is a fully self-contained, bench-top anisotropic reactive ion etch (RIE) system with innovative design features such as an automated chamber lid, and an interlocked chamber enclosure that provides an added level of safety for customers using corrosive gases.

January 1, 2010
Nordson MARCH wishes everyone a Happy New Year. Our offices will open after the holidays on Monday, January 4, 2010.